Thin Film Design & Applications  
  
 
 
 
 

 

Materials Page 
Terminology
References 3 & 4

HfF4 (Hafnium Fluoride)

l (nm) n k
600 1.57  
700 1.56  
1000 1.55  
1500 1.53  
8000 1.46  
9000 1.46 0.010
10000 1.46 0.030
11000 1.46 0.050
12000 1.46 0.070

Bulk Properties

Melting Point: 
Density: 7.0 gm/cc

 

Film Properties

Evap. Temp.: 1200 ºC
Film Growth: 
Film Hardness:  Soft

Common uses:   IR antireflection coatings.

Comments:  Good substitute for Thorium Fluoride.

 

 

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